| File | Description | Format |
|---|---|---|
TL_Thesis_Bound.pdf
(2MB)
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(no description provided) |
| Title: | Low-Temperature Chemical Vapor Deposition of Ruthenium and Manganese Nitride Thin Films |
| Author(s): | Lazarz, Teresa S. |
| Doctoral Committee Chair(s): | Abelson, John R. |
| Doctoral Committee Member(s): | Girolami, Gregory S.; Rockett, Angus; Braun, Paul V.; Earles, Susan K. |
| Department / Program: | Materials Science and Engineering |
| Graduate Major: | Materials Science and Engineering |
| Degree Granting Institution: | University of Illinois at Urbana-Champaign |
| Degree: | Ph.D. |
| Genre: | Dissertation |
| Subject(s): |
CVD
chemical vapor deposition ruthenium manganese nitride Ru Mn-N film deposition |
| Abstract: | Materials and thin film processing development has been and remains key to continuing to make ever smaller, or miniaturized, microelectronic devices. In order to continue miniaturization, conformal, low-temperature deposition of new electronic materials is needed. Two techniques capable of conformality have emerged: chemical vapor deposition (CVD) and atomic layer deposition (ALD). Here, two processes for deposition of materials which could be useful in microelectronics, but for which no low-temperature, conformal process has been established as commercializable, are presented. One is ruthenium, intended for use in interconnects and in dynamic random access memory electrodes, a known material for use in microelectronics but for which a more conformal, yet fast process than previously demonstrated is required. The other is manganese nitride, which could be used as active magnetic layers in devices or as a dopant in materials for spintronics, which is not yet established as a desired material in part due to the lack of any previously known CVD or ALD process for deposition. |
| Issue Date: | 2009-09-25 |
| Genre: | Dissertation / Thesis |
| Type: | Text |
| Language: | English |
| URI: | http://hdl.handle.net/2142/13834 |
| Publication Status: | unpublished |
| Peer Reviewed: | not peer reviewed |
| Date Available in IDEALS: | 2009-09-25 |