Helal, Y.H.; Armacost, M.D.; Walker, Q.; Stout, P.J.; Ewing, P.R.; De Lucia, F.C.; Neese, C.F. SUBMILLIMETER SPECTROSCOPIC DIAGNOSTICS IN SEMICONDUCTOR PROCESSING PLASMAS. Proceedings of the International Symposium on Molecular Spectroscopy, Urbana, IL, June 16-21, 2014.

Submillimeter absorption spectroscopy was used to study semiconductor processing plasmas.  Abundances and temperatures of molecules, radicals, and ions can be determined without altering any of the properties of the plasma.  The behavior of these measurements provides useful applications in monitoring process steps.  A summary of such applications will be presented, including etching and cleaning endpoint detection.