Browse Dept. of Nuclear, Plasma, and Radiological Engineering by Subject "Plasma diagnostics"
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Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization (2013-08-22)Ionized physical vapor deposition is used to deposit the barrier and seed layers in the state of the art interlevel metallization process. As the critical dimension keeps shrinking, it has become increasingly difficult to ...
(2011-01-14)Deposition of indium tin oxide (ITO) among various transparent conductive materials on flexible organic substrates has been intensively investigated among academics and industrials for a whole new array of imaginative ...