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Title:Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering
Author(s):Truong, Tu T.
Director of Research:Rogers, John A.
Doctoral Committee Chair(s):Rogers, John A.
Doctoral Committee Member(s):Nuzzo, Ralph G.; Kenis, Paul J. A.; Bailey, Ryan C.
Department / Program:Chemistry
Discipline:Chemistry
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Soft lithography
plasmonic crystals
Surface enhanced Raman spectroscopy (SERS)
Raman scattering
polydimethylsiloxane
surface plasmon
Abstract:The interest of unconventional techniques for nanofabrication has grown exponentially in recent years due to demanding equirements in micro/nanoscale structures for photonics, microfluidics, biotechnology, and flexible electronics. Soft lithographic methods use elastomeric stamps, molds and conformable photomasks as patterning elements to provide capabilities that are unavailable with conventional techniques: patterning at molecular scale resolution (~1 nm); ability to form three-dimensional (3D) structure directly, in a single step; experimental simplicity and applicability to large areas. This dissertation explores new materials for the soft molds in order to enhance the resolution and application of soft lithographic methods. A commercially available perfluoropolyethylene (a-PFPE) and a synthesized material based on poly[(3-mercaptopropyl) methylsiloxane] (PMMS) are used in a variety of soft lithographic techniques for high fidelity and high resolution patterning. As an application example, I describe a class of quasi-3D plasmonic crystals for biosensing as well as surface-enhanced Raman scattering, with the connection to theoretical results obtained from rigorous electrodynamics simulations.
Issue Date:2010-05-14
URI:http://hdl.handle.net/2142/15547
Rights Information:Copyright 2010 Tu Thanh Truong
Date Available in IDEALS:2010-05-14
2012-05-15
Date Deposited:May 2010


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