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Title:Modification of an ultra-high-vacuum scanning tunneling microscope for silicon nanostructure fabrication
Author(s):Zhang, Fan
Advisor(s):Lyding, Joseph W.
Department / Program:Electrical & Computer Eng
Discipline:Electrical & Computer Engr
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:M.S.
Genre:Thesis
Subject(s):scanning tunneling microscope (STM)
silicon
nanostrucuture
Abstract:In this thesis, two major modifications to an ultra-high-vacuum scanning tunneling microscope system are described: an update to the cooling plate structure for more effective cooling of the dipstick and sample holder, and the installation of a capillary doser for concentrating the precursor gas to the tip-ample junction during silicon nanostructure growth. The updated cooling plate is able to shorten the total sample preparation time from 6 hours to 3 hours. The capillary doser lowers the base pressure during the silicon growth experiment by two orders of magnitude. The system operation after the system modification was tested. The system is now ready for subsequent silicon nanostructure growth using disilane gas.
Issue Date:2011-01-14
URI:http://hdl.handle.net/2142/18461
Rights Information:Copyright 2010 Fan Zhang
Date Available in IDEALS:2011-01-14
Date Deposited:December 2


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