Files in this item
|(no description provided)|
|Title:||Numerical modeling of electron cyclotron resonance plasma|
|Author(s):||Anghel, Vinicius Nicolae Petre|
|Doctoral Committee Chair(s):||Axford, Roy A.|
|Department / Program:||Nuclear, Plasma, and Radiological Engineering|
|Degree Granting Institution:||University of Illinois at Urbana-Champaign|
|Subject(s):||Physics, Fluid and Plasma|
|Abstract:||The semiconductor industry is introducing electron cyclotron resonance (ECR) plasma reactors as reliable wafer etching tools. This industry requires radially uniform etching rate and radially uniform etching anisotropy. The etching rate and etching anisotropy depend on the ECR plasma properties.
The magnetized plasma equations are solved along magnetic field lines in cylindrical geometry. Generalizing Guan et al. (1), the plasma equations on different field lines are coupled by ambipolar charged particle diffusion across magnetic field lines. Electrons and one ion species are considered to move in a neutral gas. The neutral gas density is given by a simple model. Electron impact ionization, ion-neutral and ion-ion elastic scattering, and ion-neutral charge exchange are taken into account.
The magnetic field lines are traced in cylindrical geometry by solving the differential equations for field lines in terms of a definite integral. On each field line, the continuity, momentum, parallel and perpendicular energy equations for ions are solved using a shooting method. The neighborhoods of the boundary points are treated by an original numerical method for first-order systems of singular differential equations. The charged particle perpendicular leakage is evaluated by an original "finite-difference" method, by considering field lines instead of points.
The results of the computation show that the profile of the microwave power absorption is the dominant factor controlling the ion current on the wafer electrode. Varying divergence of the magnetic field lines improves the radial uniformity of the ion current, at the expense of decreasing it.
|Rights Information:||Copyright 1996 Anghel, Vinicius Nicolae Petre|
|Date Available in IDEALS:||2011-05-07|
|Identifier in Online Catalog:||AAI9702448|
This item appears in the following Collection(s)
Graduate Dissertations and Theses at Illinois
Graduate Theses and Dissertations at Illinois
Dissertations and Theses - Nuclear, Plasma, and Radiological Engineering