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Control policies for scheduling of semiconductor manufacturing plants

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Title: Control policies for scheduling of semiconductor manufacturing plants
Author(s): Lu, Steve Chi-Hung
Doctoral Committee Chair(s): Kumar, P. R.
Department / Program: Electrical and Computer Engineering
Discipline: Electrical Engineering
Degree Granting Institution: University of Illinois at Urbana-Champaign
Degree: Ph.D.
Genre: Dissertation
Subject(s): Engineering, Electronics and Electrical Engineering, Industrial Operations Research
Abstract: We study the problem of scheduling large semiconductor manufacturing facilities which can be modeled as re-entrant lines and the stability of such re-entrant lines for several buffer priority and due-date-based policies subject to deterministic bursty arrivals. By stability, we mean that the work-in-process in the system is bounded for all time, or equivalently, the delay of a job flowing through the system is bounded. Not all buffer priority policies are stable, as witnessed by a counterexample which thus instigates the stability study.We introduce a new class of scheduling policies, called Fluctuation Smoothing (FS), which reduces various fluctuations in the network. We have tested our policies on the research and development (R&D) fabrication line that has been studied by Wein (37). By means of an extended simulation experiment, it is shown that the Fluctuation Smoothing Policy for the Variance of Cycle Time (FSVCT) can reduce, very effectively, the variance of cycle time, while the Fluctuation Smoothing Policy for the Mean Cycle Time (FSMCT) reduces the mean cycle time. For example, under the recommended Workload Regulation Release policy, our policy achieves a reduction of 22.4% in the mean queueing time, and a reduction of 52.0% in the standard deviation of cycle time, over that for the baseline FIFO policy. Statistical tests corroborate our conclusions.
Issue Date: 1994
Type: Text
Language: English
URI: http://hdl.handle.net/2142/22295
Rights Information: Copyright 1994 Lu, Steve Chi-Hung
Date Available in IDEALS: 2011-05-07
Identifier in Online Catalog: AAI9503259
OCLC Identifier: (UMI)AAI9503259
 

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