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Title:Strain at surface and interface steps
Author(s):Pohland, Oliver Hermann
Doctoral Committee Chair(s):Gibson, J. Murray
Department / Program:Physics
Discipline:Physics
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Physics, Condensed Matter
Engineering, Materials Science
Abstract:Transmission Electron Microscopy (TEM) is a powerful tool for the study of interface and surface phenomena. Its sensitivity to lattice plane orientation allows for the imaging of crystal strain. In this thesis, I will present a unique method for quantitatively measuring crystal strain using TEM. This method relies on the quantitative comparison of experimental and simulated dark field images. Employing this technique has allowed for the measurement of strain at surface and interface steps for the first time. It will be shown that a Si(111) 7 x 7 surface step possesses appreciable long range strain. This strain increases by more than an order of magnitude for Si(111)/Ge and Si(111)/SiO$\sb2$ interface steps. The presence of strain has important consequences for surface and interface properties, and these are briefly discussed.
Issue Date:1996
Type:Text
Language:English
URI:http://hdl.handle.net/2142/22825
ISBN:9780591088243
Rights Information:Copyright 1996 Pohland, Oliver Hermann
Date Available in IDEALS:2011-05-07
Identifier in Online Catalog:AAI9702639
OCLC Identifier:(UMI)AAI9702639


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