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Title:Kinetic processes and plasma remediation of toxic gases
Author(s):Gentile, Ann Catherine
Doctoral Committee Chair(s):Kushner, Mark J.
Department / Program:Physics, Fluid and Plasma
Engineering, Environmental
Discipline:Physics, Fluid and Plasma
Engineering, Environmental
Degree Granting Institution:University of Illinois at Urbana-Champaign
Subject(s):Physics, Fluid and Plasma
Engineering, Environmental
Abstract:Regulations on the allowable emissions of toxic gases have resulted in increasing industrial interest in the development of energy efficient methods for remediation. In this work we computationally study the application of Dielectric Barrier Discharges to the remediation of perchloroethylene (C$\sb2$Cl$\sb4$ or PCE) and N$\rm\sb{x}$O$\rm\sb{y}$. We determine the kinetic processes that occur in remediation in order to devise methods for improving the energy efficiency of remediation.
PCE remediation progresses by a chain chemistry. Removal is efficient in humid gas streams since reactions of H$\sb2$O initiate the production of radicals necessary for remediation. The end products can be further treated by conventional methods and then exhausted.
Processes during N$\rm\sb{x}$O$\rm\sb{y}$ remediation can be considered in terms of three time regimes. During the pulse, radicals are produced. NO and N$\rm\sb{x}$O$\rm\sb{y}$ are then remediated. At long times NO is converted to NO$\sb2$ with no net change in N$\rm\sb{x}$O$\rm\sb{y}$. Remediation of NO is largely due to reduction by N. Removal is more efficient with higher applied voltage, faster rising pulses, more H$\sb2$O in the gas stream, and more pulses of lower energy.
Spatial dependencies can affect the energy efficiencies of remediation. Localized energy deposition in the streamer can result in high temperatures facilitating production of NO. Diffusion of NO into the streamer region and advective transport of N outward into the bulk gas increase remediation. At very high energy depositions, transport decreases the instantaneous rate of change of efficiency with energy deposition despite the increased temperature.
Issue Date:1995
Rights Information:Copyright 1995 Gentile, Ann Catherine
Date Available in IDEALS:2011-05-07
Identifier in Online Catalog:AAI9624350
OCLC Identifier:(UMI)AAI9624350

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