IDEALS Home University of Illinois at Urbana-Champaign logo The Alma Mater The Main Quad

X-ray photoelectron spectroscopy (XPS) study of single crystal UO2 and U3O8 on r-plane sapphire and yttrium stabilized zirconium (YSZ) substrates

Show simple item record

Bookmark or cite this item: http://hdl.handle.net/2142/24051

Files in this item

File Description Format
PDF Strehle_Melissa.pdf (2MB) (no description provided) PDF
Title: X-ray photoelectron spectroscopy (XPS) study of single crystal UO2 and U3O8 on r-plane sapphire and yttrium stabilized zirconium (YSZ) substrates
Author(s): Strehle, Melissa M.
Advisor(s): Heuser, Brent J.
Department / Program: Nuclear, Plasma, & Rad Engr
Discipline: Nuclear, Plasma, Radiolgc Engr
Degree Granting Institution: University of Illinois at Urbana-Champaign
Degree: M.S.
Genre: Thesis
Subject(s): Uranium oxide UO2 U3O8 yttrium stabilized zirconium (YSZ) R-plane Sapphire
Abstract: The purpose of the work performed in this thesis is to demonstrate the ability of a magnetron sputtering system to grow single crystal thin films of Uranium Oxides with and without specifically added Neodymium impurities. To do this we analyzed our thin films using X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Rutherford Backscattering Spectroscopy (RBS), and Secondary Ion Mass Spectroscopy (SIMS). This thesis will primarily focus on the growth of the thin films, and the analyzed results from X-ray Photoelectron Spectroscopy and X-ray Diffraction. The analysis of thin films of UO2 and U3O8 is a relatively new field with minimal data on thin films. There is however some work on bulk UO2 and U3O8. We will be able to compare our data to the data from bulk UO2 and U3O8 and predict the results from basic XPS and XRD theory. Observations to the thin films structural and electronic states will be made in comparison to bulk material. This will allow us to observe phenomenon such as oxidation, diffusion, and actinide incorporation within the film. Also, we will discuss the use of two different substrates and the quality of film that is produced during growth. Ultimately, this study will demonstrate the quality of our films and recommend the best substrate to be used in future film growth.
Issue Date: 2011-05-25
URI: http://hdl.handle.net/2142/24051
Rights Information: Copyright 2011 Melissa M. Strehle
Date Available in IDEALS: 2011-05-25
Date Deposited: 2011-05
 

This item appears in the following Collection(s)

Show simple item record

Item Statistics

  • Total Downloads: 1400
  • Downloads this Month: 52
  • Downloads Today: 3

Browse

My Account

Information

Access Key