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Title:Impact of silicon nitride thickness on the infrared sensitivity of silicon nitride-aluminum microcantilevers
Author(s):Rosenberger, Matthew
Advisor(s):King, William P.
Department / Program:Mechanical Sci & Engineering
Discipline:Mechanical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:M.S.
Genre:Thesis
Subject(s):bimaterial cantilever
thermomechanical
thermometer
infrared sensor
Abstract:This thesis investigates how silicon nitride thickness impacts the performance of silicon nitride - aluminum bimaterial cantilever infrared sensors. A model predicts cantilever behavior by considering heat transfer within and from the cantilever, cantilever optical properties, cantilever bending mechanics, and thermomechanical noise. Silicon nitride-aluminum bimaterial cantilevers of different thicknesses were designed and fabricated. Cantilever sensitivity and noise were measured when exposed to infrared laser radiation. For cantilever thickness up to 1200 nm, thicker silicon nitride results in improved signal to noise ratio due to increased absorptivity and decreased noise. The best cantilever had an incident flux sensitivity of 2.1 × 10^-3 V W^-1 m^2 and an incident flux signal to noise ratio of 406 Hz^(1/2) W^-1 m^2, which is more than an order of magnitude improvement compared to the best commercial cantilever.
Issue Date:2012-05-22
URI:http://hdl.handle.net/2142/31048
Rights Information:Copyright 2012 Matthew Rosenberger
Date Available in IDEALS:2012-05-22
Date Deposited:2012-05


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