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Title:Confinement of microplasma in silicon trenches with widths as small as 2.5 μm
Author(s):Kim, Eung Soo
Advisor(s):Eden, James G.
Department / Program:Electrical & Computer Eng
Discipline:Electrical & Computer Engr
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:M.S.
Genre:Thesis
Subject(s):microplasma
nanoplasma
Paschen's curve
pd curve
Abstract:In plasma science, the ability to confine plasma in cavities with characteristic dimensions less than 1 μm would represent a major milestone. In this thesis, realization of microplasma inside channel devices with the characteristic dimensions of 5 μm and 2.5 μm is discussed. Data collected during the characterization of 5 μm devices are consistent with Paschen’s curve. Operating devices with a characteristic dimension of 2.5 μm are also introduced in this thesis. Finally, a few potential strategies for creating “nanoplasma” devices are discussed.
Issue Date:2012-09-18
URI:http://hdl.handle.net/2142/34514
Rights Information:Copyright 2012 Eung Soo Kim
Date Available in IDEALS:2012-09-18
2014-09-18
Date Deposited:2012-08


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