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Title:Design and fabrication of novel and functional 3D structures via proximity field nano-patterning
Author(s):Gupta, Sidhartha
Director of Research:Braun, Paul V.
Doctoral Committee Chair(s):Braun, Paul V.
Doctoral Committee Member(s):Wiltzius, Pierre; Martin, Lane W.; King, William P.; Eden, James G.
Department / Program:Materials Science & Engineerng
Discipline:Materials Science & Engr
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Lithography
Optics
Optical Lithography
Interference Lithography
Nanotechnology
Materials Science
Metamaterials
Chiral Structures
Periodic 3D Structures
Phase mask lithography
Proximity Field Nano-Patterning (PnP)
Abstract:Proximity field Nano-Patterning (PnP) is a large-area interference lithography technique that is used to fabricate multi-dimensionally periodic micro-structures. Though a potent technique for 3D microfabrication that offers dual and superior advantage of scalable resolution and throughput, this technique has not seen broader adoption due to the lack of concerted design and fabrication strategies that would enable the ability to target, design for and fabricate functional structures. This work endeavors to address this critical gap. A broad genetic algorithm based inverse design technique is developed that allows the ability to design PnP experiments that can target any arbitrary structure. Furthermore, the technique of enhanced PnP (ePnP) and nano-indentation PnP (NI-PnP) are developed and demonstrated. ePnP serves to improve to address the gap between the different aspects of fabricability associated with a PnP design. NI-PnP is used as a method of fabricating gratings with multiple levels and/or complex topologies as an alternative to the more common bilevel gratings that are used as diffractive optical elements (DOE) for PnP. This move results in a significantly expanded 3D structure motif design space that can be exploited with the genetic algorithm based inverse design approach. Finally, PnP is used to demonstrate the fabrication of high quality chiral structures with sub-micron pitches – the first demonstration of chiral structures via PnP and the first repeatable demonstration with any form of interference lithography.
Issue Date:2013-02-03
URI:http://hdl.handle.net/2142/42492
Rights Information:Copyright 2012 Sidhartha Gupta
Date Available in IDEALS:2013-02-03
2015-02-03
Date Deposited:2012-12


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