Files in this item



application/pdfECE499-Fa2011-kimSeungHyun.pdf (613kB)Restricted to U of Illinois
(no description provided)PDF


Title:Observation of Plasma Propagation in AL/AL2O3 Based Microchannel Devices
Author(s):Kim, Seung Hyun
Contributor(s):Eden, J. Gary
Subject(s):plasma devices
microplasma devices
plasma propagation
optical emission profile
Abstract:Microplasma devices with aluminum/aluminum oxide can be fabricated by electrochemical and micromachining processes. Micro-discharges from those devices have received much attention in recent years both in fundamental research and for industrial applications. In this thesis, microplasma discharge dynamics in an Al/Al2O3 based microchannel device have been examined at atmospheric pressure in Ar. Microplasma is generated in a six channel Al/Al2O3 device having a width of 200-300 μm, a channel length of up to 50 mm, and a volume of 1-15 mm3 on a static gas basis. When micromachining and anodization processes are applied to 125 μm thick aluminum foils, channels have a dielectric barrier structure with the geometry of an embedded electrode. Spatiotemporally resolved optical emission profiles recorded with an ICCD camera and a telescope are presented here. The intensity profiles reveal a speed of plasma as 10-15 km/s and the direction of excited emission along the channels.
Issue Date:2011-12
Publication Status:unpublished
Peer Reviewed:not peer reviewed
Date Available in IDEALS:2014-01-13

This item appears in the following Collection(s)

Item Statistics