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Title:Fabrication and Characterization of 5 Micron Channel Silicon Plasma Device
Author(s):Kim, Eung Soo
Contributor(s):Eden, J. Gary
Subject(s):plasma devices
microplasma devices
device fabrication
device characterization
Abstract:Microplasma devices have demonstrated their suitability for several applications such as high resolution displays, photonics, and chemical reactors. This thesis focuses on the fabrication and characterization of 5 micron width microchannel plasma devices fabricated in Si. The realization of this new platform of devices is implemented through VLSI, and MEMs microfabrication techniques. The stable operation and microplasma confinement were observed from pressures as low as 400 Torr and beyond the atmospheric pressures in several novel gases.
Issue Date:2010-12
Genre:Other
Type:Text
Language:English
URI:http://hdl.handle.net/2142/46975
Publication Status:unpublished
Peer Reviewed:not peer reviewed
Date Available in IDEALS:2014-01-17


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