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Title:Submillimeter Spectroscopic Diagnostics In Semiconductor Processing Plasmas
Author(s):Helal, Yaser H.
Contributor(s):Armacost, Michael D.; Walker, Quentin; Stout, Phillip J.; Ewing, Paul R.; De Lucia, Frank C.; Neese, Christopher F.
Subject(s):Instrument/Technique Demonstration
Abstract:Submillimeter absorption spectroscopy was used to study semiconductor processing plasmas. Abundances and temperatures of molecules, radicals, and ions can be determined without altering any of the properties of the plasma. The behavior of these measurements provides useful applications in monitoring process steps. A summary of such applications will be presented, including etching and cleaning endpoint detection.
Issue Date:2014-06-17
Publisher:International Symposium on Molecular Spectroscopy
Citation Info:Helal, Y.H.; Armacost, M.D.; Walker, Q.; Stout, P.J.; Ewing, P.R.; De Lucia, F.C.; Neese, C.F. SUBMILLIMETER SPECTROSCOPIC DIAGNOSTICS IN SEMICONDUCTOR PROCESSING PLASMAS. Proceedings of the International Symposium on Molecular Spectroscopy, Urbana, IL, June 16-21, 2014. DOI: 10.15278/isms.2014.TB07
Genre:CONFERENCE PAPER/PRESENTATION
Type:Text
Language:English
URI:http://hdl.handle.net/2142/50786
DOI:10.15278/isms.2014.TB07
Rights Information:Copyright 2014 by the authors. Licensed under a Creative Commons Attribution 4.0 International License. http://creativecommons.org/licenses/by/4.0/
Date Available in IDEALS:2014-09-17
2015-04-14


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