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Title:Measurement of the Electron Density and the Attachment Rate Coefficient in Silane/helium Discharges
Author(s):Fleddermann, Charles Byrns
Department / Program:Electrical Engineering
Discipline:Electrical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Subject(s):Engineering, Electronics and Electrical
Abstract:The electron density in helium and silane/helium glow discharge plasmas was measured in a hollow cathode discharge using microwave diagnostic techniques. When silane is added to the discharge gas, the electron density is drastically reduced, which is attributed to dissociative attachment to a product of the dissociation of the parent silane molecules, either SiH(,2) or SiH(,3). The rate coefficient for the dissociative attachment process was determined to be 2.65 x 10('-10) cm('3)/sec. This indicates that the attachment of electrons by silane fragments is an important kinetic process in silane discharges, and should be considered in models of the glow discharge deposition process.
Issue Date:1985
Description:68 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1985.
Other Identifier(s):(UMI)AAI8600179
Date Available in IDEALS:2014-12-15
Date Deposited:1985

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