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Title:X-Ray Diffraction Studies of Palladium-Silicide Thin Films
Author(s):Coulman, Betty Ann
Department / Program:Metallurgy and Mining Engineering
Discipline:Metallurgical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Materials Science
Abstract:The growth of Pd(,2)Si thin films from electron beam evaporated Pd films on Si(lll) substrates has been studied using X-ray diffraction techniques. In situ layer growth kinetics were measured over a temperature range of 160-222(DEGREES)C using an X-ray integrated intensity approach. Mosaic structure and impurity levels were analyzed. The film stresses in Pd(,2)Si layers grown at 250(DEGREES)C were determined for initial Pd thicknesses 50-750 (ANGSTROM).
Issue Date:1985
Type:Text
Description:153 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1985.
URI:http://hdl.handle.net/2142/71815
Other Identifier(s):(UMI)AAI8511600
Date Available in IDEALS:2014-12-16
Date Deposited:1985


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