Files in this item
| Files | Description | Format |
|---|---|---|
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application/pdf  B31-824.pdf (61MB) | (no description provided) | |
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application/pdf 78-2217.pdf (539kB) | Cover |
Description
| Title: | Studies of High-Dose Ion Implantation in Silicon |
| Author(s): | Tsai, Mon Yen |
| Subject(s): | High-dose ion implantation in silicon
Recrystallization of implanted amorphous silicon |
| Issue Date: | 1978-09 |
| Publisher: | Coordinated Science Laboratory, University of Illinois at Urbana-Champaign |
| Series/Report: | Coordinated Science Laboratory Report no. UILU-ENG 78-2217, R-824 |
| Genre: | Report (Grant or Annual) |
| Type: | Text |
| Language: | English |
| Description: | Coordinated Science Laboratory changed its name from Control Systems Laboratory |
| URI: | http://hdl.handle.net/2142/75634 |
| Sponsor: | Joint Services Electronics Program / DAAB-07-72-C-0259 National Science Foundation / NSF DMR 77-22228 |
| Date Available in IDEALS: | 2015-04-22 2017-07-14 |