Files in this item
| Files | Description | Format |
|---|---|---|
|
application/pdf  B49-UILU-ENG-88-2217.pdf (78MB) | (no description provided) |
Description
| Title: | Metalorganic Chemical Vapor Deposition and Its Application to the Growth of the Heterostructure Hot Electron Diode |
| Author(s): | Emanuel, Mark Andrew |
| Subject(s): | MOCVD
OMVPE NDR Negative differential resistance |
| Issue Date: | 1988-03 |
| Publisher: | Coordinated Science Laboratory, University of Illinois at Urbana-Champaign |
| Series/Report: | Coordinated Science Laboratory Report no. UILU-ENG-88-2217 |
| Genre: | Report |
| Type: | Text |
| Language: | English |
| Description: | Coordinated Science Laboratory was formerly known as Control Systems Laboratory |
| URI: | http://hdl.handle.net/2142/75742 |
| Sponsor: | Joint Services Electronics Program / N00014-84-C-0149 National Science Foundation Materials Research Laboratory / DMR 83-16981 National Science Foundation Engineering Research Center for Compound Semiconductor Microelectronics / CDR 85-22666 Department of Defense University Research Instrumentation Program / N00014-84-G-0157 |
| Date Available in IDEALS: | 2015-04-22 2017-07-14 |