Files in this item
Files | Description | Format |
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application/pdf ![]() ![]() | Full text |
Description
Title: | Metalorganic Chemical Vapor Deposition and Its Application to the Growth of the Heterostructure Hot Electron Diode |
Author(s): | Emanuel, Mark Andrew |
Subject(s): | MOCVD
OMVPE NDR Negative differential resistance |
Issue Date: | 1988-03 |
Publisher: | Coordinated Science Laboratory, University of Illinois at Urbana-Champaign |
Series/Report: | Coordinated Science Laboratory Report no. UILU-ENG-88-2217 |
Genre: | Report (Grant or Annual) |
Type: | Text |
Language: | English |
Description: | Coordinated Science Laboratory was formerly known as Control Systems Laboratory |
URI: | http://hdl.handle.net/2142/75742 |
Sponsor: | Joint Services Electronics Program / N00014-84-C-0149 National Science Foundation Materials Research Laboratory / DMR 83-16981 National Science Foundation Engineering Research Center for Compound Semiconductor Microelectronics / CDR 85-22666 Department of Defense University Research Instrumentation Program / N00014-84-G-0157 |
Date Available in IDEALS: | 2015-04-22 2017-07-14 |