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Title:Stochastic Space-Charge in Projection Electron Lithography and High Resolution Transmission Electron Microscopy
Author(s):Schwartz, Adam Micah
Doctoral Committee Chair(s):Gibson, J. Murray
Department / Program:Physics
Discipline:Physics
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Physics, Condensed Matter
Abstract:The effects of space-charge have been investigated for the past half-century; the longevity of this research stems from the difficulty of the problem and from the technological advances which have availed new opportunities in which to study the phenomena. This thesis investigates a specific effect, the degradation in image resolution, as observed in two advanced technologies: SCattering with Angular Limitation Projection Electron Lithography (SCALPEL) and High-Resolution Transmission Electron Microscopy (HRTEM). These particular technologies were chosen for their technological relevance and their distinct mechanisms of image formation--SCALPEL exploits amplitude contrast while HRTEM exploits phase contrast. To provide insights into the occurring space-charge physics in both technologies, this thesis uses analytical modeling, Monte Carlo simulations and experimental techniques. Using these techniques, an approximation based on the nearest neighbor (NN) is developed, and its applicability to each system is presented. The NN predictions are compared to existing theories. Furthermore, design considerations and fundamental limitations for each technique are discussed. Lastly, future research directions are suggested.
Issue Date:1998
Type:Text
Language:English
Description:120 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.
URI:http://hdl.handle.net/2142/80654
Other Identifier(s):(MiAaPQ)AAI9834739
Date Available in IDEALS:2015-09-25
Date Deposited:1998


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