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Title:Electrothermal Simulation and Temperature-Sensitive Reliability Diagnosis for CMOS VLSI Circuits
Author(s):Cheng, Yi-Kan
Doctoral Committee Chair(s):Kang, Sung-Mo (Steve)
Department / Program:Electrical Engineering
Discipline:Electrical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Electronics and Electrical
Abstract:ILLIADS-T has been successfully applied to the electromigration (EM) reliability diagnosis and timing analysis. By considering both transistor and interconnect temperatures, the temperature-sensitive EM-induced mean time-to-failure and critical path timing are estimated and discussed.
Issue Date:1997
Type:Text
Language:English
Description:125 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997.
URI:http://hdl.handle.net/2142/81203
Other Identifier(s):(MiAaPQ)AAI9812555
Date Available in IDEALS:2015-09-25
Date Deposited:1997


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