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Title:Low-Pressure Metalorganic Chemical Vapor Deposition of High-Gain InGaP/GaAs Heterojunction Bipolar Transistors
Author(s):Yang, Qinghong (Jack)
Doctoral Committee Chair(s):Stillman, Gregory E.
Department / Program:Electrical Engineering
Discipline:Electrical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Electronics and Electrical
Abstract:The impact of the emitter and cap growth conditions on the gain of heterojunction bipolar transistors (HBTs) was studied by annealing to simulate the prolonged growth of HBTs with a heavily carbon-doped base. The results indicate that postgrowth annealing at a temperature close to the growth temperature of the device causes both hydrogen removal from the base and carbon-related defect formation. This effect is caused by the amount of thermal stress applied to the device by either prolonging the anneal or going to a higher temperature. The findings from the annealing study were applied to varying the emitter and cap growth conditions. Data above shows that reducing the cap growth time or temperature can improve the gain of an HBT. Reducing the cap growth temperature is a more efficient way to minimize the self-annealing effect on the base.
Issue Date:1999
Type:Text
Language:English
Description:68 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1999.
URI:http://hdl.handle.net/2142/81300
Other Identifier(s):(MiAaPQ)AAI9945036
Date Available in IDEALS:2015-09-25
Date Deposited:1999


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