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Title:Dynamics of High- and Low -Pressure Plasma Remediation
Author(s):Xu, Xudong "Peter"
Doctoral Committee Chair(s):Kushner, Mark J.
Department / Program:Electrical Engineering
Discipline:Electrical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Environmental Sciences
Abstract:The use of DBDs as excimer ultraviolet (UV) lighting sources was also studied. The mixture Xe/Cl2 ≈ 99/1 was found to be an optimum gas mixture for the generation of the XeCl*. Higher applied voltage improves both the intensity and efficiency of UV photon generations. The strong attachment at high Cl2 concentration (e.g., ≥5%) leads to electron shell propagation to smaller radii after the voltage pulse.
Issue Date:1999
Type:Text
Language:English
Description:212 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1999.
URI:http://hdl.handle.net/2142/81327
Other Identifier(s):(MiAaPQ)AAI9955683
Date Available in IDEALS:2015-09-25
Date Deposited:1999


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