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Title:Multiscale Approaches for Simulation of Nucleation, Growth, and Additive Chemistry During Electrochemical Deposition of Thin Metal Films
Author(s):Stephens, Ryan Mark
Doctoral Committee Chair(s):Alkire, Richard C.
Department / Program:Chemical Engineering
Discipline:Chemical Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Materials Science
Abstract:A two-step approach was used to calculate the spatial distribution of nucleation events on an electrode undergoing deposition by electrolysis under the influence of mass transport. The simulations were carried out by first, calculating the time-dependent concentration profiles in the vicinity of a hemispherical nucleus, then using the concentration profiles as boundary conditions for a surface simulation that relied on the island dynamics algorithm. The model additive system was found to uniformize the distribution of nuclei on the simulated surface, leading to a significant reduction in the size of nucleation exclusion zones.
Issue Date:2008
Type:Text
Language:English
Description:226 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2008.
URI:http://hdl.handle.net/2142/82412
Other Identifier(s):(MiAaPQ)AAI3337829
Date Available in IDEALS:2015-09-25
Date Deposited:2008


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