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Title:Preparations and Characterizations of Tantalum Pentoxide-Titanium Dioxide: Ceramics and Thin Films
Author(s):Hemjinda, Sarunya
Doctoral Committee Chair(s):Payne, David A.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Materials Science
Abstract:A chemical-solution deposition method was used to integrate thin films of Ta2O5-TiO2 onto silicon substrates. Precursor solutions were successfully prepared using Ta(OEt)5 and Ti(OEt) 4 in ethanol. Solution stability was shown to be influenced by several factors, including, Rw ratio, additions of HCl, and, most importantly, conditions of hydrolysis. Electrical measurements revealed that amorphous films exhibited the most favorable dielectric properties, with low tandelta = 0.005 and K' = 27.
Issue Date:2001
Type:Text
Language:English
Description:191 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001.
URI:http://hdl.handle.net/2142/82709
Other Identifier(s):(MiAaPQ)AAI3030436
Date Available in IDEALS:2015-09-25
Date Deposited:2001


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