Files in this item



application/pdf3044221.pdf (6MB)Restricted to U of Illinois
(no description provided)PDF


Title:Phase Composition, Microstructure, and Physical Properties of Poly- and Single-Crystal Tantalum Nitride Layers
Author(s):Shin, Chan Soo
Doctoral Committee Chair(s):Greene, Joseph E.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Subject(s):Engineering, Materials Science
Abstract:Polycrystalline delta-TaN layers deposited on SiO2 at 350°C with Ei = 20 eV in mixed Ar+15%N2 discharges initially exhibit competitive texture evolution until a single texture dominates at t ≳ 200 nm. The preferred orientation of 500-nm-thick Ei = 20 eV layers can be selectively and continuously varied from predominantly underdense 111 to nearly complete dense 002 by varying ion-to-Ta flux ratio Ji/JTa from 1.3 to ≥7.4. The change in texture is primarily due to an increased steady state atomic N coverage, resulting from collisionally-induced dissociative chemisorption of incident energetic N+2 ions, with increasing Ji/JTa.
Issue Date:2002
Description:147 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2002.
Other Identifier(s):(MiAaPQ)AAI3044221
Date Available in IDEALS:2015-09-25
Date Deposited:2002

This item appears in the following Collection(s)

Item Statistics