Files in this item



application/pdf3160952.pdf (5MB)Restricted to U of Illinois
(no description provided)PDF


Title:Stress Induced Deformations of Thin Silicon Dioxide Films
Author(s):Serrano, Justin Raymond
Doctoral Committee Chair(s):Cahill, David G.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Subject(s):Engineering, Materials Science
Abstract:The behavior of compressive silicon dioxide films deposited by magnetron sputtering, on PMMA, a low Tg polymer, were also studied. SiO2 films exhibited a linear increase in the surface roughness for deposited thickness below ∼10 nm; larger thickness showed an almost unchanged roughness. Since stresses generated in thin films during sputtering are independent of surface morphology, the roughening of the films is treated as a stress-driven roughening mechanism, where the compressive stress in the films causes buckling of the films during growth.
Issue Date:2004
Description:107 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2004.
Other Identifier(s):(MiAaPQ)AAI3160952
Date Available in IDEALS:2015-09-25
Date Deposited:2004

This item appears in the following Collection(s)

Item Statistics