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Description
Title: | Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors |
Author(s): | Jayaraman, Sreenivas |
Doctoral Committee Chair(s): | Abelson, John R. |
Department / Program: | Materials Science and Engineering |
Discipline: | Materials Science and Engineering |
Degree Granting Institution: | University of Illinois at Urbana-Champaign |
Degree: | Ph.D. |
Genre: | Dissertation |
Subject(s): | Chemistry, Inorganic |
Abstract: | Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film. |
Issue Date: | 2005 |
Type: | Text |
Language: | English |
Description: | 127 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005. |
URI: | http://hdl.handle.net/2142/82770 |
Other Identifier(s): | (MiAaPQ)AAI3199029 |
Date Available in IDEALS: | 2015-09-25 |
Date Deposited: | 2005 |
This item appears in the following Collection(s)
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Dissertations and Theses - Materials Science and Engineering
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Graduate Dissertations and Theses at Illinois
Graduate Theses and Dissertations at Illinois