Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors

Jayaraman, Sreenivas

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Title:	Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors
Author(s):	Jayaraman, Sreenivas
Doctoral Committee Chair(s):	Abelson, John R.
Department / Program:	Materials Science and Engineering
Discipline:	Materials Science and Engineering
Degree Granting Institution:	University of Illinois at Urbana-Champaign
Degree:	Ph.D.
Genre:	Dissertation
Subject(s):	Chemistry, Inorganic
Abstract:	Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.
Issue Date:	2005
Type:	Text
Language:	English
Description:	127 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005.
URI:	http://hdl.handle.net/2142/82770
Other Identifier(s):	(MiAaPQ)AAI3199029
Date Available in IDEALS:	2015-09-25
Date Deposited:	2005