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Title:Chemical Vapor Deposition of Transition Metal Diborides From Borohydride Precursors
Author(s):Jayaraman, Sreenivas
Doctoral Committee Chair(s):Abelson, John R.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Chemistry, Inorganic
Abstract:Both HfB2 and CrB2 depositions were highly conformal. For example, a 65 nm wide trench with a 19:1 depth-width aspect ratio was coated uniformly with HfB2. The coverage improved further when an additional flux of a growth suppressor was added during deposition. Super-conformal CrB2 films were deposited by using atomic hydrogen, produced in a remote plasma source, as the suppressor. Growth suppression by atomic nitrogen enabled bottom-up filling of a 19:1 aspect ratio trench with an Hf-B-N film.
Issue Date:2005
Type:Text
Language:English
Description:127 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2005.
URI:http://hdl.handle.net/2142/82770
Other Identifier(s):(MiAaPQ)AAI3199029
Date Available in IDEALS:2015-09-25
Date Deposited:2005


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