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Title:Chemical Vapor Deposition of Metal Diboride and Metal Oxide Thin Films From Borohydride-Bonded Precursors
Author(s):Yang, Yu
Doctoral Committee Chair(s):Abelson, John R.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Chemistry, Inorganic
Abstract:The high Tc superconductor MgB2 were deposited at low temperatures (T = 300°C--400°C) from a recently developed highly volatile borohydride-bonded Mg precursor, by means of catalyst-enhanced chemical vapor deposition. The films are stoichiometric and highly crystallized, however, the lattice constants shift away from the MgB2 structure to the diboride structure of the catalyst metal, suggesting that Mg is partially substituted by the corresponding metals.
Issue Date:2007
Type:Text
Language:English
Description:249 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007.
URI:http://hdl.handle.net/2142/82806
Other Identifier(s):(MiAaPQ)AAI3270058
Date Available in IDEALS:2015-09-25
Date Deposited:2007


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