Files in this item

FilesDescriptionFormat

application/pdf

application/pdf9812649.pdf (5MB)Restricted to U of Illinois
(no description provided)PDF

Description

Title:Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
Author(s):Karr, Brian William
Doctoral Committee Chair(s):Cahill, David G.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Materials Science
Abstract:The group IV-B transition metal nitride TiN is widely employed as a wear-resistant coating on mechanical components and as a diffusion barrier in microelectronic devices. I use the epitaxial growth of single crystal TiN as a model system for insight on the evolution of surface morphology and microstructure in more complex polycrystalline films. Atomically-flat MgO substrates, prepared by air annealing at 950$\sp\circ$C for 12 hours, are verified by atomic force microscopy (AFM). Epitaxial TiN layers are grown on MgO(001) by reactive magnetron sputter deposition in pure N$\sb2$ at $\rm65048$ V leads to enhanced surface roughening with decreased in-plane length scales resulting from bulk defect production.
Issue Date:1997
Type:Text
Language:English
Description:152 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1997.
URI:http://hdl.handle.net/2142/82887
Other Identifier(s):(MiAaPQ)AAI9812649
Date Available in IDEALS:2015-09-25
Date Deposited:1997


This item appears in the following Collection(s)

Item Statistics