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Title:Surface Reaction Mechanisms in Plasma Etching Processes
Author(s):Zhang, Da
Doctoral Committee Chair(s):Kushner, Mark J.
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Chemical
Abstract:Surface reactions occurring in fluorocarbon plasmas also influence plasma properties by consuming or generating plasma fluxes. Of particular interest is the effect that surfaces have on CF2 densities, as CF2 is a precursor for polymer formation. These processes were investigated with the integrated plasma-surface model. Simulations demonstrated that CF 2 self-sticking is a loss at the surface, while ion sputtering and large ion dissociation can generate CF2 at surfaces. The net effect of the surface depends on the relative magnitudes of the loss and generation reactions.
Issue Date:2000
Type:Text
Language:English
Description:155 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000.
URI:http://hdl.handle.net/2142/82937
Other Identifier(s):(MiAaPQ)AAI9990206
Date Available in IDEALS:2015-09-25
Date Deposited:2000


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