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Title:Electrical Properties of Nitride/oxide Multilayered Thin Films
Author(s):Chung, Hyunim
Doctoral Committee Chair(s):Mark Shannon
Department / Program:Materials Science and Engineering
Discipline:Materials Science and Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Chemical
Abstract:SASAS film did not have a smoother surface compared to SiNx films. Therefore, surface roughness was not a factor for the increased dielectric strength of the multilayered films. There were no observed dielectric strength increase for the nitride/nitride, oxide/oxide multilayered films.
Issue Date:2001
Type:Text
Language:English
Description:142 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001.
URI:http://hdl.handle.net/2142/82939
Other Identifier(s):(MiAaPQ)AAI9996622
Date Available in IDEALS:2015-09-25
Date Deposited:2001


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