Transition Metal Hydroborate Complexes: Structures, Syntheses, and Use as Chemical Vapor Deposition Precursors

Goedde, Dean Matthew

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Title:	Transition Metal Hydroborate Complexes: Structures, Syntheses, and Use as Chemical Vapor Deposition Precursors
Author(s):	Goedde, Dean Matthew
Doctoral Committee Chair(s):	Girolami, Gregory S.
Department / Program:	Chemistry
Discipline:	Chemistry
Degree Granting Institution:	University of Illinois at Urbana-Champaign
Degree:	Ph.D.
Genre:	Dissertation
Subject(s):	Chemistry, Inorganic
Abstract:	Passage of Zr(BH4)4 over heated substrates with a coincident flux of H atoms gives adhesive, mirror-bright films at a growth rate of 60 A/min. These films are smooth on the nanometer scale and possess electrical resistivities as low as 45 muO-cm. The films are free of carbon and have low concentrations of oxygen (∼4 at. %). Deposition at 150°C achieves films of formula ZrB1.8O 0.1. In contrast, films grown under purely thermal conditions or by other plasma-assisted methods have boron-to-metal ratios near 3:1 and oxidize readily in air.
Issue Date:	2001
Type:	Text
Language:	English
Description:	181 p. Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2001.
URI:	http://hdl.handle.net/2142/84023
Other Identifier(s):	(MiAaPQ)AAI3017083
Date Available in IDEALS:	2015-09-25
Date Deposited:	2001