Files in this item

FilesDescriptionFormat

application/pdf

application/pdf9989972.pdf (6MB)Restricted to U of Illinois
(no description provided)PDF

Description

Title:Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces
Author(s):Crane, Elizabeth Larson
Doctoral Committee Chair(s):Nuzzo, Ralph G.
Department / Program:Chemistry
Discipline:Chemistry
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Chemistry, Inorganic
Abstract:Metal deposition from hexafluoroacetylacetonate complexes is also examined on Cu(111) and Pt(100) surfaces single crystal surfaces. In the case of the Rh(hfac)(C2H4)2 and Pt(hfac)2 on a copper surface, the transfer of the hfac ligands takes place below ∼220 K and this species subsequently either decomposes or reacts with the substrate to form Cu(hfac)2. This latter reaction is promoted by the presence of platinum on the copper surface but not by the presence of rhodium. In the reaction of Pt(hfac)2 on Pt(100), ligand dissociation begins ∼400 K and the resultant CFx surface fragments recombine to form a fluorocarbon species. This pathway is more strongly promoted in the presence of hydrogen as a reducing agent.
Issue Date:2000
Type:Text
Language:English
Description:169 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000.
URI:http://hdl.handle.net/2142/84478
Other Identifier(s):(MiAaPQ)AAI9989972
Date Available in IDEALS:2015-09-25
Date Deposited:2000


This item appears in the following Collection(s)

Item Statistics