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Title:Soft Lithographic Patterning on Silicon
Author(s):Finnie, Krista Renee
Doctoral Committee Chair(s):Nuzzo, Ralph G.
Department / Program:Chemistry
Discipline:Chemistry
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Chemistry, Inorganic
Abstract:A methodology for controlling the nanoscale architecture of etched silicon was developed though the printing of mixed monolayers. Contact printing of mixed solutions of different mole fractions of DTS and octyltrichlorosilane (OCTY) were formed monolayers on Si. Once annealed in air, these films were placed into KOH etching solutions and the resulting grain structures were examined via AFM. The data showed that different mole fractions created different grain structures after exposure to the etching solution. Additionally, the resulting etch structures were tested for photoluminescence, though only weak PL was found.
Issue Date:2000
Type:Text
Language:English
Description:136 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2000.
URI:http://hdl.handle.net/2142/84480
Other Identifier(s):(MiAaPQ)AAI9989994
Date Available in IDEALS:2015-09-25
Date Deposited:2000


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