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Title:Multi-Scale Transport Phenomena in Low-Pressure Plasmas
Author(s):Grapperhaus, Michael James
Doctoral Committee Chair(s):Kushner, Mark J.
Department / Program:Nuclear Engineering
Discipline:Nuclear Engineering
Degree Granting Institution:University of Illinois at Urbana-Champaign
Degree:Ph.D.
Genre:Dissertation
Subject(s):Engineering, Electronics and Electrical
Abstract:To account for the surface effects on the plasma behavior, a mesoscale Monte Carlo simulation has been developed which joins the die-scale surface chemistry with the plasma scale in the HPEM. The presence of etch products in the plasma is seen to perturb the bulk plasma. The presence of photoresist redeposition is seen to have a minor, but important, effect on the etch rate. At low pressure, the etch rate is increased, although the probability of a given ion causing an etch is decreased.
Issue Date:1998
Type:Text
Language:English
Description:116 p.
Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1998.
URI:http://hdl.handle.net/2142/85937
Other Identifier(s):(MiAaPQ)AAI9834680
Date Available in IDEALS:2015-09-28
Date Deposited:1998


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