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Title:The low pressure chemical vapor deposition of germanium by the thermal decomposition of germane on <100> silicon
Author(s):Coronell, Daniel G.
Discipline:Chemical Engineering
Degree:B.S. (bachelor's)
Genre:Thesis
Subject(s):Chemical engineering
Issue Date:1988
Genre:Dissertation/Thesis
Type:Text
Language:English
Description:Thesis (B.S.) in Chemical Engineering -- University of Illinois at Urbana-Champaign, 1988.
Bibliography: leaf 33.
Microfiche of typescript. [Urbana, Ill.]: Photographic Services, University of Illinois, U of I Library, [1988]. 2 microfiches (52 frames): negative.
URI:http://hdl.handle.net/2142/93710
Rights Information:Copyright 1988 by author
Date Available in IDEALS:2016-11-11
Identifier in Online Catalog:3108688
OCLC Identifier:(OCoLC)ocm24123413


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