Files in this item

FilesDescriptionFormat

application/pdf

application/pdfJaworski_Michael_A_MS.pdf (99MB)Restricted to U of Illinois
(no description provided)PDF

application/pdf

application/pdfJaworski_Michael_A_MS_ABS.pdf (586kB)Restricted to U of Illinois
AbstractPDF

Description

Title:Debris Reduction by Means of a Secondary Plasma System With a Dense Plasma Focus Extreme Ultraviolet Light Source
Author(s):Jaworski, Michael A.
Discipline:Nuclear, Plasma, and Radiological Engineering
Degree:M.S. (master's)
Genre:Thesis
Subject(s):nuclear engineering
debris reduction
secondary plasma system
dense plasma focus
ultraviolet light source
miniaturization
semiconductor devices
light sources
wavelengths
ultraviolet light
Issue Date:2006
Genre:Dissertation/Thesis
Type:Text
Language:English
URI:http://hdl.handle.net/2142/96392
Rights Information:Copyright 2006 Michael Andrew Jaworski
Date Available in IDEALS:2017-07-06


This item appears in the following Collection(s)

Item Statistics