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application/pdf ![]() ![]() | Abstract |
Description
Title: | Ion Energy Characterization Study for Next Generation Semiconductor Lithography Based on Gas Discharge Produced Plasma Technology |
Author(s): | Spencer, Joshua B. |
Discipline: | Nuclear, Plasma, and Radiological Engineering |
Degree: | M.S. (master's) |
Genre: | Thesis |
Subject(s): | nuclear engineering
lithography gas discharge plasma ion energy bragg interference |
Issue Date: | 2007 |
Genre: | Dissertation / Thesis |
Type: | Text |
Language: | English |
URI: | http://hdl.handle.net/2142/96543 |
Rights Information: | Copyright 2007 Melissa Anita Schear |
Date Available in IDEALS: | 2017-07-06 |
This item appears in the following Collection(s)
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Graduate Dissertations and Theses at Illinois
Graduate Theses and Dissertations at Illinois -
Dissertations and Theses - Nuclear, Plasma, and Radiological Engineering