Files in this item
| Files | Description | Format |
|---|---|---|
|
application/pdf  Spencer_Joshua_B_MS.pdf (3MB) | (no description provided) | |
|
application/pdf Spencer_Joshua_B_MS_ABS.pdf (11kB) | Abstract |
Description
| Title: | Ion Energy Characterization Study for Next Generation Semiconductor Lithography Based on Gas Discharge Produced Plasma Technology |
| Author(s): | Spencer, Joshua B. |
| Discipline: | Nuclear, Plasma, and Radiological Engineering |
| Degree: | M.S. (master's) |
| Genre: | Thesis |
| Subject(s): | nuclear engineering
lithography gas discharge plasma ion energy bragg interference |
| Issue Date: | 2007 |
| Genre: | Dissertation / Thesis |
| Type: | Text |
| Language: | English |
| URI: | http://hdl.handle.net/2142/96543 |
| Rights Information: | Copyright 2007 Melissa Anita Schear |
| Date Available in IDEALS: | 2017-07-06 |
This item appears in the following Collection(s)
-
Graduate Dissertations and Theses at Illinois
Graduate Theses and Dissertations at Illinois -
Dissertations and Theses - Nuclear, Plasma, and Radiological Engineering