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Title:Ion Energy Characterization Study for Next Generation Semiconductor Lithography Based on Gas Discharge Produced Plasma Technology
Author(s):Spencer, Joshua B.
Discipline:Nuclear, Plasma, and Radiological Engineering
Degree:M.S. (master's)
Genre:Thesis
Subject(s):nuclear engineering
lithography
gas discharge plasma
ion energy
bragg interference
Issue Date:2007
Genre:Dissertation/Thesis
Type:Text
Language:English
URI:http://hdl.handle.net/2142/96543
Rights Information:Copyright 2007 Melissa Anita Schear
Date Available in IDEALS:2017-07-06


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