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Title:Measurment of Process Plasma Parameters in a RF Capacitively Coupled Device
Author(s):Wilson, Jeffrey L.
Discipline:Nuclear, Plasma, and Radiological Engineering
Degree:M.S. (master's)
Genre:Thesis
Subject(s):nuclear engineering
process plasma parameters
rf capacity coupled device
beam component behavior
Argon plasma
Issue Date:1989
Genre:Dissertation/Thesis
Type:Text
Language:English
URI:http://hdl.handle.net/2142/96594
Rights Information:Copyright 2001 Bradley Lee Wescott
Date Available in IDEALS:2017-07-06


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