2026-09-22T06:29:18Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/115418 2023-07-11 col_2142_5131 col_2142_8888 com_2142_5130 com_2142_8887 com_2142_234

Dallesasse, John M 2022-05 application/pdf en text Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2022-11-11 without embargo terms The student, Mark Kraman, accepted the attached license on 2022-04-21 at 10:21. The student, Mark Kraman, submitted this Thesis for approval on 2022-04-21 at 10:27. This Thesis was approved for publication on 2022-04-26 at 12:41. DSpace SAF Submission Ingestion Package generated from Vireo submission #17875 on 2022-11-11 at 13:42:44 Impurity-induced disordering of vertical-cavity surface-emitting lasers: Applications to polarization control and high-speed modulation Kraman, Mark D. 2022-04-26 vertical-cavity surface-emitting laser impurity-induced disordering single-mode high-speed modulation polarization Impurity-induced disordering (IID) of vertical-cavity surface-emitting lasers (VCSELs) as a platform technology enables mode engineering through the precise introduction of mirror loss while simultaneously improving top distributed Bragg reflector (DBR) conductivity. Strain-engineering of the diffusion masks used in IID processing impacts characteristics of the aspect ratio of the disordering diffusant and enables high-power single-mode emission. The modulation response and applicability of this platform to the goal of polarization control in 850 nm gallium arsenide-based oxide-confined VCSELs are investigated. An analysis of the high-frequency damping factors of IID VCSELs given varying disordering depths is provided. The experimental design and fabrication process for polarization controlled VCSELs using elliptical strain-engineered disorder-defined apertures is discussed, and measured polarization characteristics are analyzed as a function of strained diffusion mask ellipticity. The orthogonal polarization suppression ratios (OPSRs) of VCSELs using circular disorder-defined apertures under strain-engineered diffusion mask variants are discussed. Thesis eng https://hdl.handle.net/2142/115418 © 2022 Mark D. Kraman M.S. Thesis Electrical & Computer Engr University of Illinois at Urbana-Champaign Electrical & Computer Eng