2026-09-21T14:03:14Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/14655 2023-07-10 col_2142_14837 col_2142_5131 com_2142_14836 com_2142_234 com_2142_5130

Ruzic, David N. Ruzic, David N. Struck, Corey R. 2010-01-06T16:20:35Z 2010-01-06T16:20:35Z 2010-01-06T16:20:35Z As semiconductor feature sizes continue to decrease, the phenomena of line edge roughness (LER) becomes more disruptive in chip manufacturing. While many efforts are underway to decrease LER from the photoresist, post-develop smoothing techniques may be required to continue shrinking chip features economically. This work reports on one such method employing the use of an ion beam at grazing incidence along the features. This method smooths relatively long spatial length LER, a potential advantage over other smoothing techniques that focus on just molecular scale LER. LER reduction numbers Variables include beam energy and angular dependence. LER measurements are taken using Hitachi image analysis software on top-down analytical SEM measurements. Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2009-12-03T15:22:41Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Struck_Corey.pdf: 23327281 bytes, checksum: a1fefe452bb6c27cd789cc92afd26727 (MD5) Made available in DSpace on 2010-01-06T16:20:35Z (GMT). No. of bitstreams: 5 license.txt: 4060 bytes, checksum: 98b131b9d313fd33c590a995b8f45e2d (MD5) Struck_Corey.pdf: 23334295 bytes, checksum: b22a2af3fa92d0a59683bd27f4d3e081 (MD5) 1_Struck_Corey.pdf: 23335427 bytes, checksum: 3e7109ed64d76467dddcf65c0245920d (MD5) 2_Struck_Corey.pdf: 23327281 bytes, checksum: a1fefe452bb6c27cd789cc92afd26727 (MD5) 3_Struck_Corey.pdf: 23348761 bytes, checksum: 223d644e0b43b239458e8f5f7acd2907 (MD5) http://hdl.handle.net/2142/14655 en Copyright 2009 Corey R. Struck Line Edge Roughness Line Width Roughness Reduction of Line Edge Roughness in Semiconductor Photoresist by Means of a Grazing Incidence Ion Beam 2009-12 Nuclear Plasma and Radiological Engineering 1973 Nuclear Engineering 0139 University of Illinois at Urbana-Champaign Thesis M.S. MS:Nuclear Engineering -UIUC 10KS0139MS