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Li, Xiuling Li, Xiuling Bassett, Kevin P. 2010-01-06T16:42:06Z 2010-01-06T16:42:06Z 2012-01-07T11:00:10Z 2010-01-06T16:42:06Z Metalorganic chemical vapor deposition is examined as a technique for growing compound semiconductor structures. Material analysis techniques for characterizing the quality and properties of compound semiconductor material are explained and data from recent commissioning work on a newly installed reactor at the University of Illinois is presented. Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2009-12-09T21:15:41Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Bassett_Kevin.pdf: 1725493 bytes, checksum: 506e56384f97aa5adbfef5a64105c676 (MD5) Made available in DSpace on 2010-01-06T16:42:06Z (GMT). No. of bitstreams: 2 license.txt: 4063 bytes, checksum: 5f7e49ae05ee2b686623c2bc6cb95e90 (MD5) Bassett_Kevin.pdf: 1725493 bytes, checksum: 506e56384f97aa5adbfef5a64105c676 (MD5) Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by William Ingram (wingram2@illinois.edu) on 2010-01-06T16:42:22Z Item is restricted until 2012-01-06T16:42:19Z Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2012-01-07T11:00:10Z Item was in collections: Dissertations and Theses - Electrical and Computer Engineering (ID: 446) University of Illinois Dissertations and Theses (ID: 204) No. of bitstreams: 3 Bassett_Kevin.pdf.txt: 70033 bytes, checksum: f8be6773ef3b1f1fc38a39924829766a (MD5) license.txt: 4063 bytes, checksum: 5f7e49ae05ee2b686623c2bc6cb95e90 (MD5) Bassett_Kevin.pdf: 1725493 bytes, checksum: 506e56384f97aa5adbfef5a64105c676 (MD5) Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2012-01-07T11:00:10Z http://hdl.handle.net/2142/14733 en Copyright 2009 Kevin P. Bassett Metal-organic chemical vapor deposition (MOCVD) Organometallic vapor phase epitaxy (OMVPE) Metalorganic vapour phase epitaxy (MOVPE) Growth and Characterization of III-V Semiconductor Materials for MOCVD Reactor Qualification and Process Control 2009-12 Electrical & Computer Eng 1933 Electrical & Computer Engr 1200 University of Illinois at Urbana-Champaign Thesis M.S. PHD:Electr & Computer Eng-UIUC 10KS1200PHD