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oai:www.ideals.illinois.edu:2142/15547 2023-07-10 col_2142_5131 col_2142_14789 com_2142_5130 com_2142_14788 com_2142_8903

plasmonic crystals Made available in DSpace on 2010-05-14T20:49:43Z (GMT). No. of bitstreams: 2 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5) Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by William Ingram (wingram2@illinois.edu) on 2010-05-14T20:52:44Z Item is restricted until 2012-05-14T20:52:43Z Item reinstated by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-15T10:00:29Z Item was in collections: University of Illinois Dissertations and Theses (ID: 204) Dissertations and Theses - Chemistry (ID: 676) No. of bitstreams: 3 Truong_Tu.pdf.txt: 256997 bytes, checksum: 87283e8dc03bbeeaa100cb34f129e822 (MD5) Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) license.txt: 4059 bytes, checksum: 907fd9f6c2816e57946815d7d73b2f8e (MD5) Item released from any restrictions by Sarah Shreeves (sshreeve@illinois.edu) on 2012-05-15T10:00:30Z http://hdl.handle.net/2142/15547 en Rogers, John A. Rogers, John A. Nuzzo, Ralph G. Kenis, Paul J.A. Bailey, Ryan C. Truong, Tu T. 2010-05-14T20:49:43Z 2010-05-14T20:49:43Z 2012-05-15T10:00:30Z 2010-05-14T20:49:43Z The interest of unconventional techniques for nanofabrication has grown exponentially in recent years due to demanding equirements in micro/nanoscale structures for photonics, microfluidics, biotechnology, and flexible electronics. Soft lithographic methods use elastomeric stamps, molds and conformable photomasks as patterning elements to provide capabilities that are unavailable with conventional techniques: patterning at molecular scale resolution (~1 nm); ability to form three-dimensional (3D) structure directly, in a single step; experimental simplicity and applicability to large areas. This dissertation explores new materials for the soft molds in order to enhance the resolution and application of soft lithographic methods. A commercially available perfluoropolyethylene (a-PFPE) and a synthesized material based on poly[(3-mercaptopropyl) methylsiloxane] (PMMS) are used in a variety of soft lithographic techniques for high fidelity and high resolution patterning. As an application example, I describe a class of quasi-3D plasmonic crystals for biosensing as well as surface-enhanced Raman scattering, with the connection to theoretical results obtained from rigorous electrodynamics simulations. Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-02-01T19:39:33Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 1 Truong_Tu.pdf: 43938504 bytes, checksum: a79f2e17b49e8749b1272d63565e91fa (MD5) Copyright 2010 Tu Thanh Truong Soft lithography Surface enhanced Raman spectroscopy (SERS) Raman scattering polydimethylsiloxane surface plasmon Soft lithography - materials and applications to plasmonic sensing and surface-enhanced raman scattering 2010-5 Chemistry 1413 Chemistry 0335 University of Illinois at Urbana-Champaign Dissertation Ph.D. PHD:Chemistry -UIUC 10KS0335PHD