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          <dc:subject>Microplasma</dc:subject>
          <dc:subject>Silicon microplasma device</dc:subject>
          <dc:subject>microlaser</dc:subject>
          <dc:subject>microjet</dc:subject>
          <dc:title>Silicon microcavity and microchannel plasma devices: spectroscopy and time-resolved optical experiments</dc:title>
          <dc:contributor>Eden, James G.</dc:contributor>
          <dc:creator>Kim, Taek-Lim</dc:creator>
          <dc:date>2010-05-18T18:53:01Z</dc:date>
          <dc:date>2010-05-18T18:53:01Z</dc:date>
          <dc:date>2012-05-19T10:00:12Z</dc:date>
          <dc:date>2010-05-18T18:53:01Z</dc:date>
          <dc:description>Novel microcavity and microchannel plasma devices in Si have provided new and efficient sources of visible, ultraviolet (UV) and vacuum ultraviolet (VUV) radiation. The realization of this new platform for devices is implemented through VLSI and MEMS fabrication techniques. In this thesis, the basic physics of plasma discharges is presented, and the performance of Si microplasma devices with inverted pyramidal cavity and V-grooved channel configurations is described in some detail.</dc:description>
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          <dc:identifier>http://hdl.handle.net/2142/15971</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2010 Taek-Lim Kim</dc:rights>
          <dc:date>2010-5</dc:date>
          <degree>
            <department>Electrical &amp; Computer Eng</department>
            <departmentCode>1933</departmentCode>
            <discipline>Electrical &amp; Computer Engr</discipline>
            <disciplineCode>1200</disciplineCode>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
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            <name>M.S.</name>
            <program>MS:Electr &amp; Computer Eng-UIUC</program>
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