2026-09-20T07:55:45Z https://www.ideals.illinois.edu/oai-pmh

oai:www.ideals.illinois.edu:2142/16074 2023-07-10 col_2142_5131 col_2142_8888 com_2142_5130 com_2142_8887 com_2142_234

Pathways for quantum dot optoelectronics fabrication using soft nanoimprint lithography Cheng, Keh-Yung Cheng, Keh-Yung Hsieh, Kuang-Chien Feng, Milton Cunningham, Brian T. Meneou, Kevin J. 2010-05-19T18:34:02Z 2010-05-19T18:34:02Z 2010-05-19T18:34:02Z Nanoimprint lithography is a low-cost, high-throughput alternative to traditional serial nanolithography technologies. Here it is explored for application in the optoelectronics area. A variant of NIL using a flexible polymeric mold, termed “soft NIL” is used to create and study quantum dot arrays according to two concepts. In the first concept, a dense array of nano-sized holes are etched into a blank GaAs substrate. When a thin InAs quantum dot (QD) layer is grown on top, the QDs nucleate only at the locations of the holes, resulting in an array of site-controlled quantum dots. This concept shall be called “regrown QDs.” In the second concept, soft NIL is used to pattern an etch mask atop a sample consisting of an InP substrate topped by an InGaAs quantum well. Anisotropic dry etching is used to etch the sample down to the InP substrate to form an array of pillars, each containing a QD. For each concept, the morphology and optical performance are studied, and refinements are pursued to gain finer control over the morphology and brighter luminescence from the QDs. Finally, a plan is presented for incorporation of each concept into a double heterostructure layer design to yield a quantum dot laser. Item withdrawn by Alexis Thompson (athmpsn1@illinois.edu) on 2010-03-26T20:32:39Z Item was in collections: University of Illinois Theses & Dissertations (ID: 1) No. of bitstreams: 10 uiucthesisbib.bib: 54312 bytes, checksum: 1e9dfc556bf2c66fd429a2d966861c77 (MD5) snhabstract.tex: 1275 bytes, checksum: 74e31a4dd64f7897eae8a2be49ebfff7 (MD5) snhacknowledge.tex: 3127 bytes, checksum: 7ec18939757c23f24c1a86b768b0a89c (MD5) snhdedication.tex: 141 bytes, checksum: c0efa4ce9bb45a47620fe39ddeb77389 (MD5) kjmPhD.tex: 3006 bytes, checksum: 96954ba5a89a24f009c95ba3050a1154 (MD5) kjmintro.tex: 27744 bytes, checksum: d5d1d386a7b5e6655b47c630d989116e (MD5) kjmregrown.tex: 54688 bytes, checksum: 34ac45b905f43b37d867c57edc055a8d (MD5) kjmpillars.tex: 38599 bytes, checksum: 050924c23c151f2d38d826becd7c5ed0 (MD5) kjmconc.tex: 10125 bytes, checksum: 285aa3e3d4ff3778473b0cf59b6d5e4a (MD5) Meneou_Kevin.pdf: 23072085 bytes, checksum: d1172387505f85970e5697f6adfa914a (MD5) Made available in DSpace on 2010-05-19T18:34:02Z (GMT). No. of bitstreams: 11 uiucthesisbib.bib: 54312 bytes, checksum: 1e9dfc556bf2c66fd429a2d966861c77 (MD5) snhabstract.tex: 1275 bytes, checksum: 74e31a4dd64f7897eae8a2be49ebfff7 (MD5) snhacknowledge.tex: 3127 bytes, checksum: 7ec18939757c23f24c1a86b768b0a89c (MD5) snhdedication.tex: 141 bytes, checksum: c0efa4ce9bb45a47620fe39ddeb77389 (MD5) kjmPhD.tex: 3006 bytes, checksum: 96954ba5a89a24f009c95ba3050a1154 (MD5) kjmintro.tex: 27744 bytes, checksum: d5d1d386a7b5e6655b47c630d989116e (MD5) kjmregrown.tex: 54688 bytes, checksum: 34ac45b905f43b37d867c57edc055a8d (MD5) kjmpillars.tex: 38599 bytes, checksum: 050924c23c151f2d38d826becd7c5ed0 (MD5) kjmconc.tex: 10125 bytes, checksum: 285aa3e3d4ff3778473b0cf59b6d5e4a (MD5) Meneou_Kevin.pdf: 23072085 bytes, checksum: d1172387505f85970e5697f6adfa914a (MD5) license.txt: 4060 bytes, checksum: 54d599beaa1883bfea0a882048ef1987 (MD5) http://hdl.handle.net/2142/16074 en Copyright 2010 Kevin J. Meneou Molecular beam epitaxy Optoelectronics Quantum dots Nanoimprint lithography Nanofabrication and microfabrication Reactive ion etching 2010-5 Electrical & Computer Eng 1933 Electrical & Computer Engr 1200 University of Illinois at Urbana-Champaign Dissertation Ph.D. PHD:Electr & Computer Eng-UIUC 10KS1200PHD