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        <identifier>oai:www.ideals.illinois.edu:2142/16160</identifier>
        <datestamp>2023-07-10</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:contributor>Fang, Nicholas X.</dc:contributor>
          <dc:creator>Alonso, Matthew P.</dc:creator>
          <dc:date>2010-05-19T18:39:19Z</dc:date>
          <dc:date>2010-05-19T18:39:19Z</dc:date>
          <dc:date>2010-05-19T18:39:19Z</dc:date>
          <dc:description>The rapid manufacture of complex three-dimensional components has eluded researchers for decades.  Several manufacturing options have been limited by either speed or the ability to fabricate true three-dimensional structures.  Over the last decade, projection stereolithography has been developed to manufacture true three-dimensional structures in a faster manner than traditional processes.  This work discusses the development of a projection stereolithography system and the different process parameters that affect part quality.  A functional system has been created at Lawrence Livermore National Laboratory and several unique components have been fabricated to demonstrate its capabilities.  Examples of true three-dimensional structures and tunable porous materials are presented.</dc:description>
          <dc:description>Item withdrawn by Mark Zulauf (zulauf@illinois.edu) on 2010-04-30T14:59:31Z
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University of Illinois Theses &amp; Dissertations (ID: 1)
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          <dc:identifier>http://hdl.handle.net/2142/16160</dc:identifier>
          <dc:language>en</dc:language>
          <dc:rights>Copyright 2010 Matthew Alonso</dc:rights>
          <dc:subject>3D microfabrication</dc:subject>
          <dc:subject>photolithography</dc:subject>
          <dc:title>Optimization of a light emitting diode based projection stereolithography system and its applications</dc:title>
          <dc:date>2010-5</dc:date>
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            <department>Mechanical Sci &amp; Engineering</department>
            <departmentCode>1917</departmentCode>
            <discipline>Mechanical Engineering</discipline>
            <disciplineCode>0133</disciplineCode>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Thesis</level>
            <name>M.S.</name>
            <program>MS:Mechanical Engineerng -UIUC</program>
            <programCode>10KS0133MS</programCode>
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