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        <identifier>oai:www.ideals.illinois.edu:2142/19117</identifier>
        <datestamp>2023-07-10</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:language>eng</dc:language>
          <dc:rights>Copyright 1996 Smith, Gary Michael</dc:rights>
          <dc:subject>Engineering, Electronics and Electrical</dc:subject>
          <dc:subject>Physics, Optics</dc:subject>
          <dc:subject>Engineering, Materials Science</dc:subject>
          <dc:contributor>Coleman, James J.</dc:contributor>
          <dc:creator>Smith, Gary Michael</dc:creator>
          <dc:date>2011-05-07T11:57:28Z</dc:date>
          <dc:date>2011-05-07T11:57:28Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>1996</dc:date>
          <dc:description>Single frequency semiconductor lasers are of interest for communication systems and spectroscopy. In communications, narrow linewidth is desirable to minimize dispersion effects and low cross-talk multiple wavelength channels on a single fiber. For GaAs-based lasers, the interest in narrow linewidth sources comes from the spectroscopy community that desires a light source that can be tuned to very narrow absorption spectra of various materials. For both of these applications, narrow linewidth, wavelength tunable semiconductor lasers are well-suited.</dc:description>
          <dc:description>This thesis describes the development of a single epitaxial growth ridge waveguide distributed Bragg reflector (RW-DBR) laser. These lasers exhibit low thresholds, fairly high slope efficiencies, and single frequency operation with very narrow linewidth. The fabrication requires only a single epitaxial growth of a standard laser structure and then an anisotropic etch to transfer a grating pattern from the top surface of the laser into the epitaxial layers. The initial RW-DBR lasers fabricated by this method had symmetric cladding layers with a thickness of 1.2 $\mu$m, which required etch depths of over 1 $\mu$m in order to couple adequately to the optical mode. This required a highly anisotropic etch and limited the device design to third-order gratings. However, fairly good device performance was demonstrated with these symmetric cladding RW-DBR lasers.</dc:description>
          <dc:description>To relax the constraints on the grating etch, an asymmetric cladding separate confinement heterostructure (AC-SCH) laser was developed. The AC-SCH design reduces the thickness of the top cladding layer, which results in shallower depths for the grating etch and allows the fabrication of more efficient second-order DBR gratings. The incorporation of the AC-SCH into the RW-DBR laser reduces the threshold current, increases the efficiency, and decreases the spectral linewidth.</dc:description>
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  Previous issue date: 1996</dc:description>
          <dc:description>Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T14:34:46Z
Item is restricted indefinitely.</dc:description>
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Group with Access UIUC Users [automated]
Release Date: none
Reason: ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:identifier>AAI9625195</dc:identifier>
          <dc:identifier>(UMI)AAI9625195</dc:identifier>
          <dc:identifier>http://hdl.handle.net/2142/19117</dc:identifier>
          <dc:title>Single frequency semiconductor lasers</dc:title>
          <dc:type>text</dc:type>
          <degree>
            <department>Electrical and Computer Engineering</department>
            <discipline>Electrical Engineering</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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