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        <identifier>oai:www.ideals.illinois.edu:2142/19392</identifier>
        <datestamp>2023-07-10</datestamp>
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        <thesis xmlns="http://www.ndltd.org/standards/metadata/etdms/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/" xsi:schemaLocation="http://www.ndltd.org/standards/metadata/etdms/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdms11.xsd http://purl.org/dc/elements/1.1/ http://www.ndltd.org/standards/metadata/etdms/1.1/etdmsdc.xsd">
          <dc:contributor>Gibson, J. Murray</dc:contributor>
          <dc:creator>Twesten, Ray Dudley</dc:creator>
          <dc:date>2011-05-07T12:06:09Z</dc:date>
          <dc:date>2011-05-07T12:06:09Z</dc:date>
          <dc:date>10000-01-01</dc:date>
          <dc:date>1995</dc:date>
          <dc:description>"It is well-known that a surface's structure affects its properties; the effect of a surface's intrinsic stress, however, is less widely known but just as important. Using the novel technique of ultra-high vacuum transmission electron microscopy, I have investigated both the structure and the stress of the Silicon (111) surface. The kinematic analysis of electron diffraction data was used to determine the positions of the surface atoms of the Si(111)-7x7 reconstruction. Even under the seemingly drastic kinematic approximation, the atomic positions determined were in excellent agreement with those determined by x-ray diffraction. The relation of stress to structure is revealed in the 7x7 to ""1x1"" phase transition on the Si(111) surface. While only a small amount of stress is relieved in the transition, it is clearly measurable, with a value of 30meV/A$\sp2$. This value is consistent with the disordered adatom model for ""1x1"" surface."</dc:description>
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  Previous issue date: 1995</dc:description>
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Item is restricted indefinitely.</dc:description>
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Original Data
Group with Access UIUC Users [automated]
Release Date: none
Reason: ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>ETDs are only available to UIUC Users without author permission</dc:description>
          <dc:description>U of I Only</dc:description>
          <dc:identifier>AAI9624523</dc:identifier>
          <dc:identifier>(UMI)AAI9624523</dc:identifier>
          <dc:identifier>http://hdl.handle.net/2142/19392</dc:identifier>
          <dc:language>eng</dc:language>
          <dc:rights>Copyright 1995 Twesten, Ray Dudley</dc:rights>
          <dc:subject>Engineering, Electronics and Electrical</dc:subject>
          <dc:subject>Physics, Condensed Matter</dc:subject>
          <dc:title>Stress and structure of silicon surfaces</dc:title>
          <dc:type>text</dc:type>
          <degree>
            <department>Physics</department>
            <discipline>Physics</discipline>
            <grantor>University of Illinois at Urbana-Champaign</grantor>
            <level>Dissertation</level>
            <name>Ph.D.</name>
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